Thin film metrology systems are used to measure the film thickness accurately. A series of film layers that act as a conductors, semiconductors, or bare wafers are deposited on an IC during IC fabrication. Thin film metrology systems are required during thin film deposition process to monitor and measure thin film parameters such as thickness, resistivity, and stress. There are various technologies used to measure the film thickness which include profilometry, ellipsometry, spectroscopic reflectrometry, and X-ray analysis.
TechNavio's analysts forecast the Global Thin-film Metrology Systems market will grow at a CAGR of 3.4 percent over the period 2014-2019.
Covered in this Report
This report covers the present scenario and growth prospects of the Global Thin Film Metrology Systems market for the period 2015-2019. It considers 2014 as the base year and provides data for the trailing 12 months. To calculate the market size, the report considers revenue generated from the sales of thin film metrology systems to various end-users including:
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* ODMs
* OEMs
* Foundries
Key Regions
* Americas
* APAC
* EMEA
Key Vendors
* KLA-Tencor
* Nanometrics
* Nova Measuring Instruments
* Rudolph Technologies
Other Prominent Vendors
* Hitachi High-Technologies
* SCREEN Holdings
* Semilab
KeyMarket Driver
* Increased Level of Complexity in ICs
* For a full, detailed list, view our report
KeyMarket Challenge
* Cyclic Nature of Semiconductor Industry
* For a full, detailed list, view our report
KeyMarket Trend
* Increasing Demand for Integration and Miniaturization of Semiconductor Devices
* For a full, detailed list, view our report
Key Questions Answered in this Report
* What will the market size be in 2019 and what will the growth rate be?
* What are the keyMarket Trends?
* What is driving this market?
* What are the challenges to market growth?
* Who are the Key Vendors in this market space?
* What are the market opportunities and threats faced by the Key Vendors?
* What are the strengths and weaknesses of the Key Vendors?
Research methodology is based on extensive primary and secondary research. Primary research includes in-depth interviews with industry experts, vendors, resellers and customers. Secondary research includes Technavio Platform, industry publications, company reports, news articles, analyst reports, trade associations and the data published by Government agencies.
Companies Mentioned in this Report: KLA-Tencor, Nanometrics, Nova Measuring Instruments, Rudolph Technologies, Hitachi High-Technologies, SCREEN Holdings, Semilab
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New Market Report: Global Thin Film Metrology Systems Market 2015-2019
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Contact Name: Bill Thompson
Contact Email: press@fastmr.com
Contact Phone: 1-413-485-7001
Contact Name: Bill Thompson
Contact Email: press@fastmr.com
Contact Phone: 1-413-485-7001